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1

Chemical vapor deposition precursor chemistry 1: The deposition of pure aluminum thin films from an aluminaborane precursor compound by chemical vapor deposition

John A. Glass Jr., Shreyas Kher, James T. Spencer

Journal:

Thin Solid Films

Year:

1992

Language:

english

File:

PDF, 500 KB

english, 1992

2

Chemical Vapor Deposition of Metal Borides, 4: The Application of Polyhedral Boron Clusters to the Chemical Vapor Deposition Formation of Gadolinium Boride Thin-film Materials

Shreyas S. Kher, Yexin Tan, James T. Spencer

Journal:

Applied Organometallic Chemistry

Year:

1996

Language:

english

File:

PDF, 1009 KB

english, 1996

3

Chemical vapor deposition of metal borides: 6. The formation of neodymium boride thin film materials from polyhedral boron clusters and metal halides by chemical vapor deposition

Shreyas S. Kher, Jennifer V. Romero, John D. Caruso, James T. Spencer

Journal:

Applied Organometallic Chemistry

Year:

2008

Language:

english

File:

PDF, 405 KB

english, 2008

4

Synthesis and characterization of a neutral six-coordinate tris-adduct of an indium(III) trihalide. X-ray crystal structure of InCl3(THF)3

Richard L. Wells, Shreyas S. Kher, Ryan A. Baldwin, Peter S. White

Journal:

Year:

1994

Language:

english

File:

PDF, 416 KB

english, 1994

5

Synthesis and addition polymerization of vinylbenzyl transition metal compounds

Shreyas S. Kher, Terence A. Nile

Journal:

Transition Metal Chemistry

Year:

1991

Language:

english

File:

PDF, 357 KB

english, 1991

6

CHEMICAL VAPOR DEPOSITION OF METAL BORIDES: 7. THE RELATIVELY LOW TEMPERATURE FORMATION OF CRYSTALLINE LANTHANUM HEXABORIDE THIN FILMS FROM BORON HYDRIDE CLUSTER COMPOUNDS BY CHEMICAL VAPOR DEPOSITION

Shreyas S Kher, James T Spencer

Journal:

Journal of Physics and Chemistry of Solids

Year:

1998

Language:

english

File:

PDF, 295 KB

english, 1998

7

Chemical vapor deposition precursor chemistry. 2. Formation of pure aluminum, alumina, and aluminum boride thin films from boron-containing precursor compounds by chemical vapor deposition

Glass, John A., Kher, Shreyas S., Spencer, James T.

Journal:

Chemistry of Materials

Year:

1992

Language:

english

File:

PDF, 2.02 MB

english, 1992

8

Chemical vapor deposition precursor chemistry. 3. Formation and characterization of crystalline nickel boride thin films from the cluster-assisted deposition of polyhedral borane compounds

Kher, Shreyas S., Spencer, James T.

Journal:

Chemistry of Materials

Year:

1992

Language:

english

File:

PDF, 1.99 MB

english, 1992

9

A Straightforward, New Method for the Synthesis of Nanocrystalline GaAs and GaP

Kher, Shreyas S., Wells, Richard L.

Journal:

Chemistry of Materials

Year:

1994

Language:

english

File:

PDF, 3.11 MB

english, 1994

10

Determination of Relevant Size Parameters for Sonicated and Unsonicated Nanocrystalline GaAs Particles

Hagan, Carolynne R. S., Kher, Shreyas S., Halaoui, Lara I., Wells, Richard L., Coury, Louis A.

Journal:

Analytical Chemistry

Year:

1995

Language:

english

File:

PDF, 2.13 MB

english, 1995

11

Synthesis of Nanocrystalline Indium Arsenide and Indium Phosphide from Indium(III) Halides and Tris(trimethylsilyl)pnicogens. Synthesis, Characterization, and Decomposition Behavior of I3In.cntdot.P(SiMe3)3

Wells, Richard L., Aubuchon, Steven R., Kher, Shreyas S., Lube, Michael S., White, Peter S.

Journal:

Chemistry of Materials

Year:

1995

Language:

english

File:

PDF, 2.16 MB

english, 1995

12

[ECS 210th ECS Meeting - Cancun, Mexico (October 29-November 3, 2006)] ECS Transactions - Development of 300mm MOCVD HfSiOx Process

Shi, Xiaoping, Schaekers, Marc, Date, Lucien, Rothschild, Aude, Everaert, Jean-Luc, Van Elshocht, Sven, Rosseel, Erik, Kher, Shreyas

Year:

2006

Language:

english

File:

PDF, 178 KB

english, 2006

13

Deposition and characterization of HfO2 high k dielectric films

Lo, Wai, Kamath, Arvind, Kher, Shreyas, Metzner, Craig, Wen, Jianguo, Chen, Zhihao

Journal:

Journal of Materials Research

Year:

2004

Language:

english

File:

PDF, 984 KB

english, 2004

14

Tunable Workfunction with TaN Metal Gate on HfO2-HfxSiyO Dielectrics

Olsen, Christopher S., Kraus, Philip A., Ahmed, Khaled Z., Kher, Shreyas, Hung, Steven, Krishna, Nety, Chen, Jeff, Date, Lucien, Burey, Marc, Campbell, Jason

Journal:

MRS Proceedings

Year:

2004

Language:

english

File:

PDF, 56 KB

english, 2004

15

The Deposition of Nickel Boride Thin Films by Borane and Metallaborane Cluster Compounds

Glass, John A., Kher, Shreyas, Kim, Yoon-Gi, Dowben, P.A., Spencer, James T.

Journal:

MRS Proceedings

Year:

1990

Language:

english

File:

PDF, 1.47 MB

english, 1990

16

The Deposition of Aluminum and Aluminum Boride Thin Films by Aluminaborane Cluster Compounds

Glass, John A., Kher, Shreyas, Hersee, Stephen D., Ramseyer, G., Spencer, James T.

Journal:

MRS Proceedings

Year:

1990

Language:

english

File:

PDF, 1.52 MB

english, 1990

17

The Chemical Vapor Deposoitin of Pure Nickel and Nickel Boride Thin Films from Borane Cluster Compounds

Kher, Shreyas, Spencer, James T.

Journal:

MRS Proceedings

Year:

1991

Language:

english

File:

PDF, 2.51 MB

english, 1991

18

A Low Temperature, Solution Phase Synthesis of III-V Semiconductor Nanocrystals

Kher, Shreyas S., Wells, Richard L.

Journal:

MRS Proceedings

Year:

1994

Language:

english

File:

PDF, 1003 KB

english, 1994

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